| CPC H01M 4/0471 (2013.01) [B21B 1/40 (2013.01); B21D 33/00 (2013.01); H01M 4/0435 (2013.01); H01M 4/381 (2013.01); Y10T 29/30 (2015.01)] | 7 Claims |
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1. A method of forming an alkali metal electrode consisting essentially of a {110} surface texturing, comprising:
providing an alkali metal foil;
first annealing the alkali metal foil at a first temperature of about 70 to 90 percent of a melting point of the alkali metal foil for 1 to 3 hours;
optionally first cooling the alkali metal foil to room temperature, wherein the alkali metal foil has a randomized surface crystallographic orientation;
washing the chemical polishing solution with a solvent for the chemical polishing solution;
first rolling the alkali metal foil to about 300 μm at room temperature;
scraping a surface layer of about 50 μm in thickness from the alkali metal foil at a temperature of about 70 to about 90 percent of the melting point of the alkali metal foil, wherein scraping is along a same axis as the first rolling;
second annealing the alkali metal foil at a second annealing temperature of about 70 percent of the melting point of the alkali metal foil for about 0.5 hours;
second rolling the alkali metal foil at the second annealing temperature to about 200 μm in thickness;
optionally second cooling the alkali metal foil to room temperature; and
cutting the alkali metal foil to a shape of an electrode, wherein the alkali metal electrode consists essentially of a {110} surface texturing.
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