US 12,444,684 B2
Semiconductor device including parallel configuration
Fei Fan Duan, Hsinchu (TW); Fong-yuan Chang, Hsinchu (TW); Chi-Yu Lu, Hsinchu (TW); Po-Hsiang Huang, Hsinchu (TW); and Chih-Liang Chen, Hsinchu (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed by TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed on Nov. 27, 2023, as Appl. No. 18/519,513.
Application 18/519,513 is a continuation of application No. 17/389,141, filed on Jul. 29, 2021, granted, now 11,854,973.
Claims priority of provisional application 63/192,696, filed on May 25, 2021.
Claims priority of provisional application 63/185,802, filed on May 7, 2021.
Prior Publication US 2024/0096800 A1, Mar. 21, 2024
Int. Cl. H01L 23/528 (2006.01); G06F 30/398 (2020.01); H01L 23/522 (2006.01); G03F 1/36 (2012.01); G06F 119/12 (2020.01); H01L 23/532 (2006.01)
CPC H01L 23/5283 (2013.01) [G06F 30/398 (2020.01); H01L 23/5226 (2013.01); G03F 1/36 (2013.01); G06F 2119/12 (2020.01); H01L 23/53209 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A semiconductor device comprising:
first and second active regions extending in parallel in a substrate;
a plurality of conductive patterns, each conductive pattern of the plurality of conductive patterns extending continuously on the substrate across each of the first and second active regions;
a plurality of metal lines, each metal line of the plurality of metal lines overlying and extending continuously across each of the first and second active regions,
wherein each conductive pattern of the plurality of conductive patterns is electrically connected in parallel with each metal line of the plurality of metal lines from the first active region to the second active region;
a first middle metal line overlying and electrically connected to the first active region and each conductive pattern of the plurality of conductive patterns; and
a second middle metal line overlying and electrically connected to the second active region and each conductive pattern of the plurality of conductive patterns,
wherein each metal line of the plurality of metal lines overlies and is electrically connected to each of the first and second middle metal lines.