US 12,444,621 B2
High conductance divert line architecture
Abhijit A. Kangude, San Jose, CA (US); Elizabeth Neville, Sunnyvale, CA (US); and Arun Chakravarthy Chakravarthy, Panruit (IN)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Aug. 4, 2022, as Appl. No. 17/880,885.
Prior Publication US 2024/0047232 A1, Feb. 8, 2024
Int. Cl. H01L 21/67 (2006.01)
CPC H01L 21/67017 (2013.01) [H01L 21/67167 (2013.01)] 20 Claims
OG exemplary drawing
 
7. A semiconductor processing system, comprising:
a lid plate;
a gas splitter seated on the lid plate, the gas splitter comprising a top surface and a plurality of side surfaces, wherein the gas splitter defines:
a gas inlet;
a gas outlet;
a gas lumen that extends between and fluidly couples the gas inlet with the gas outlet; and
a divert lumen that is fluidly coupled with the gas lumen and that directs gases away from a processing chamber through a divert outlet; and
a first divert weldment that extends from and fluidly couples to the divert outlet, wherein the first divert weldment comprises a first divert weldment outlet and a second divert weldment outlet.