US 12,444,617 B2
Semiconductor wafer processing liquid containing hypobromite ions and PH buffering agent
Takafumi Shimoda, Yamaguchi (JP); Yuki Kikkawa, Yamaguchi (JP); Tomoaki Sato, Yamaguchi (JP); and Takayuki Negishi, Yamaguchi (JP)
Assigned to TOKUYAMA CORPORATION, Yamaguchi (JP)
Appl. No. 18/019,942
Filed by TOKUYAMA CORPORATION, Yamaguchi (JP)
PCT Filed Aug. 6, 2021, PCT No. PCT/JP2021/029372
§ 371(c)(1), (2) Date Feb. 6, 2023,
PCT Pub. No. WO2022/030628, PCT Pub. Date Feb. 10, 2022.
Claims priority of application No. 2020-135398 (JP), filed on Aug. 7, 2020.
Prior Publication US 2024/0014045 A1, Jan. 11, 2024
Int. Cl. H01L 21/3213 (2006.01)
CPC H01L 21/32134 (2013.01) 18 Claims
 
1. A semiconductor treatment liquid comprising (A), (B), (C), and (E) below:
(A) a hypobromite ion,
(B) a pH buffer,
(C) an onium ion, and
(E) one or more selected from the group consisting of a bromite ion and a bromate ion,
wherein a concentration of the bromite ion and bromate ion (E) is 3.3×10−6 mol/L or more and 5.0×10−1 mol/L or less.