US 12,444,465 B2
Memory device and method for manufacturing the same
Chih-Hsiung Lee, Hsinchu (TW)
Assigned to MACRONIX INTERNATIONAL CO., LTD., Hsinchu (TW)
Filed by MACRONIX INTERNATIONAL CO., LTD., Hsinchu (TW)
Filed on Apr. 27, 2022, as Appl. No. 17/730,256.
Prior Publication US 2023/0352088 A1, Nov. 2, 2023
Int. Cl. G11C 16/04 (2006.01); H10B 41/10 (2023.01); H10B 41/27 (2023.01)
CPC G11C 16/0483 (2013.01) [H10B 41/10 (2023.02); H10B 41/27 (2023.02)] 16 Claims
OG exemplary drawing
 
1. A memory device, comprising:
a stacked structure comprising conductive layers;
a lower isolation structure in the stacked structure and having an upper surface in a lower portion of the stacked structure, wherein the lower isolation structure separates at least one conductive layer of the conductive layers into a first conductive strip and a second conductive strip, the first conductive strip and the second conductive strip are electrically isolated from each other;
two memory strings in the stacked structure and electrically connected to the first conductive strip and the second conductive strip respectively;
isolation elements in the stacked structure; and
blocks separated from each other by the isolation elements, wherein the lower isolation structure is in one of the blocks between two adjacent isolation elements of the isolation elements.