US 12,443,115 B2
Measurement system and method for characterizing a patterning device
Andre Bernardus Jeunink, De Lutte (NL); Erik Henricus Egidius Catharina Eummelen, Veldhoven (NL); Bearrach Moest, Eindhoven (NL); Derk Onck, Leende (NL); Johannes Adrianus Cornelis Maria Pijnenburg, Moergestel (NL); and Hermen Folken Pen, Vught (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 17/766,049
Filed by ASML Netherlands B.V., Veldhoven (NL)
PCT Filed Sep. 7, 2020, PCT No. PCT/EP2020/074969
§ 371(c)(1), (2) Date Apr. 1, 2022,
PCT Pub. No. WO2021/063635, PCT Pub. Date Apr. 8, 2021.
Claims priority of application No. 19201296 (EP), filed on Oct. 3, 2019.
Prior Publication US 2022/0373894 A1, Nov. 24, 2022
Int. Cl. G03F 7/00 (2006.01); G03F 1/84 (2012.01)
CPC G03F 7/7085 (2013.01) [G03F 1/84 (2013.01); G03F 7/70875 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A method for determining surface parameters of a patterning device, the method comprising:
positioning the patterning device with respect to a path of an exposure radiation beam using a first measurement system and at a first focal plane of a chromatic lens arranged in a second measurement system;
illuminating a part of a surface of the patterning device with radiation through the chromatic lens, the radiation comprising a plurality of wavelengths;
determining a position of the illuminated part in a first and second direction;
collecting at least a portion of radiation reflected by the patterning device through the chromatic lens;
measuring, at a second focal plane of the chromatic lens, an intensity of the collected portion of radiation as a function of wavelength, to obtain spectral information;
determining the surface parameters of the patterning device at the determined position from the spectral information, and
maintaining a relative position of the chromatic lens with respect to the surface of the patterning device without movement during the measuring when obtaining the spectral information.