US 12,443,112 B2
Techniques for correction of aberrations
Min-Cheng Wu, Taitung County (TW); and Ching-Ju Huang, Tainan (TW)
Assigned to Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu (TW)
Filed on Nov. 22, 2023, as Appl. No. 18/517,635.
Application 18/517,635 is a continuation of application No. 17/452,831, filed on Oct. 29, 2021, granted, now 11,852,980.
Claims priority of provisional application 63/200,418, filed on Mar. 5, 2021.
Prior Publication US 2024/0085802 A1, Mar. 14, 2024
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/706 (2013.01) 20 Claims
OG exemplary drawing
 
1. An exposure tool, comprising:
one or more processors configured to:
receive deformation information indicating a temperature metric associated with a reticle;
determine, based on the temperature metric and further based on a mapping of temperature metrics to aberration drifts, an adjustment to a component of the exposure tool, wherein the mapping indicates an amount of an aberration of the reticle and is associated with one or more adjustments to one or more components of the exposure tool to compensate for the aberration; and
perform the adjustment to the component of the exposure tool.