US 12,443,104 B2
Composition for forming organic film, patterning process, and compound and polymer for forming organic film
Daisuke Kori, Joetsu (JP); Yasuyuki Yamamoto, Joetsu (JP); and Naoki Kobayashi, Joetsu (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed by SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed on Sep. 15, 2022, as Appl. No. 17/945,570.
Claims priority of application No. 2021-158467 (JP), filed on Sep. 28, 2021.
Prior Publication US 2023/0244147 A1, Aug. 3, 2023
Int. Cl. G03F 7/09 (2006.01); C07D 209/34 (2006.01); C07D 487/10 (2006.01); C08G 61/12 (2006.01); H05K 3/06 (2006.01)
CPC G03F 7/094 (2013.01) [C07D 209/34 (2013.01); C07D 487/10 (2013.01); C08G 61/124 (2013.01); H05K 3/064 (2013.01); C08G 2261/11 (2013.01); C08G 2261/1414 (2013.01); C08G 2261/1422 (2013.01); C08G 2261/1424 (2013.01); C08G 2261/148 (2013.01); C08G 2261/18 (2013.01); C08G 2261/228 (2013.01); C08G 2261/314 (2013.01); C08G 2261/3241 (2013.01)] 25 Claims
OG exemplary drawing
 
1. A composition for forming an organic film, comprising: a material for forming an organic film shown by the following general formula; and an organic solvent,

OG Complex Work Unit Chemistry
wherein R1 represents a hydrogen atom, an allyl group, or a propargyl group, R2 represents a nitro group, a halogen atom, a hydroxy group, an alkyloxy group having 1 to 4 carbon atoms, an alkynyloxy group having 2 to 4 carbon atoms, an alkenyloxy group having 2 to 4 carbon atoms, a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms, a trifluoromethyl group, or a trifluoromethyloxy group, “m” represents 0 or 1, “n” represents an integer of 1 or 2, “l” represents 0 or 1, aromatic rings forming a cyclic ether structure with one another when l=1, “k” represents an integer of 0 to 2, W represents a divalent organic group having 1 to 40 carbon atoms, and each V independently represents a hydrogen atom or a linking moiety.