| CPC G02F 1/13338 (2013.01) [G02F 1/13439 (2013.01); G02F 1/136209 (2013.01); G02F 1/136295 (2021.01); G06F 3/0412 (2013.01); G06F 3/0445 (2019.05); H10D 30/6723 (2025.01); H10D 86/0231 (2025.01); H10D 86/441 (2025.01); H10D 86/60 (2025.01); G02F 1/133345 (2013.01); G02F 1/1368 (2013.01); G02F 2201/121 (2013.01); G06F 2203/04103 (2013.01)] | 6 Claims |

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1. A manufacturing method of a display device, the manufacturing method comprising:
forming a light blocking layer on a substrate using a first mask, the substrate including an opening area and a non-opening area that surrounds the opening area;
forming an active layer on the light blocking layer using a second mask;
forming a gate line that extends in a row direction in the non-opening area using a third mask;
forming an interlayer-insulating layer that covers the gate line;
forming a first contact hole that exposes one region of the active layer using a fourth mask;
forming a data line that extends in a column direction that is perpendicular to the row direction in the non-opening area and a touch sensing line that extends in the column direction across the opening area using a fifth mask, the data line applying a data signal of an image;
forming a pixel electrode in the opening area using a sixth mask; forming a thin film transistor including a source electrode that is connected to the data line and a drain electrode that is connected to the pixel electrode; and wherein the opening area has a shape in which a length of the opening area in the row direction is longer than a length of the opening area in the column direction, wherein the touch sensing line is formed on a same layer as the data line, the source electrode, and the drain electrode with the data line located between the source electrode and the drain electrode on the same layer in at least one region, and the touch sensing line is non-overlapping with the data line.
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