US 12,442,765 B2
Transmission corrected plasma emission using in-situ optical reflectometry
Patrick Tae, Sunnyvale, CA (US); Zhaozhao Zhu, Milpitas, CA (US); Blake W. Erickson, Gilroy, CA (US); and Chunlei Zhang, Santa Clara, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Jul. 9, 2024, as Appl. No. 18/767,516.
Application 18/767,516 is a continuation of application No. 17/447,745, filed on Sep. 15, 2021, granted, now 12,031,910.
Prior Publication US 2024/0361239 A1, Oct. 31, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G01N 21/55 (2014.01)
CPC G01N 21/55 (2013.01) [G01N 2021/558 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A system comprising:
an optical sensor to:
detect a first intensity of a first beam of light, the first beam of light comprising (i) a portion, reflected from a window, of a probe light directed to the window, and (ii) a light transmitted through the window; and
detect a second intensity of a second beam of light, the second beam of light comprising the light transmitted through the window; and
a processing device communicatively coupled to the optical sensor, the processing device to:
determine, using the first intensity and the second intensity, a transmission characteristic of the window.