US 12,442,759 B2
Contaminant analyzing metrology system, lithographic apparatus, and methods thereof
Michal Emanuel Pawlowski, Norwalk, CT (US); Aage Bendiksen, Fairfield, CT (US); Christopher Michael Dohan, Redding, CT (US); and Johannes Onvlee, 's-Hertogenbosch (NL)
Assigned to ASML Holding N.V., Veldhoven (NL); and ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 17/918,317
Filed by ASML Holding N.V., Veldhoven (NL); and ASML Netherlands B.V., Veldhoven (NL)
PCT Filed Apr. 1, 2021, PCT No. PCT/EP2021/058739
§ 371(c)(1), (2) Date Oct. 11, 2022,
PCT Pub. No. WO2021/209273, PCT Pub. Date Oct. 21, 2021.
Claims priority of provisional application 63/010,353, filed on Apr. 15, 2020.
Prior Publication US 2023/0137537 A1, May 4, 2023
Int. Cl. G01N 21/31 (2006.01); G01N 21/956 (2006.01); G03F 7/00 (2006.01)
CPC G01N 21/31 (2013.01) [G01N 21/956 (2013.01); G03F 7/7085 (2013.01)] 21 Claims
OG exemplary drawing
 
1. An inspection system comprising:
an illumination system configured to generate a broadband illumination beam having a continuous spectral range and to illuminate a surface of an object with the broadband illumination beam;
a detection system configured to receive radiation scattered at the surface and by a structure near the surface and to generate a detection signal based on an optical response to the broadband illumination beam; and
processing circuitry configured for:
analyzing the detection signal, and
distinguishing, based on the analyzing, between a spurious signal corresponding to one or more internal reflections from the structure and a defect signal corresponding to a defect on the surface,
wherein the spurious signal is diminished for at least a portion of the continuous spectral range.