US 12,442,455 B2
Gas supply apparatus, vacuum processing apparatus, and gas supply method
Yoshifumi Ogawa, Tokyo (JP); Yutaka Kouzuma, Tokyo (JP); Keisuke Akinaga, Tokyo (JP); Kazuyuki Hirozane, Tokyo (JP); and Yasushi Sonoda, Tokyo (JP)
Assigned to Hitachi High-Tech Corporation, Tokyo (JP)
Appl. No. 17/762,821
Filed by Hitachi High-Tech Corporation, Tokyo (JP)
PCT Filed Feb. 8, 2021, PCT No. PCT/JP2021/004546
§ 371(c)(1), (2) Date Mar. 23, 2022,
PCT Pub. No. WO2022/168301, PCT Pub. Date Aug. 11, 2022.
Prior Publication US 2024/0055278 A1, Feb. 15, 2024
Int. Cl. F16K 11/22 (2006.01); F16K 7/02 (2006.01); F16K 11/10 (2006.01); F16K 31/126 (2006.01); H01L 21/67 (2006.01)
CPC F16K 11/22 (2013.01) [F16K 7/02 (2013.01); F16K 11/105 (2013.01); F16K 31/126 (2013.01); H01L 21/67069 (2013.01); H01L 21/67253 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A gas supply apparatus that supplies gas to a processing chamber in which a sample is processed, the gas supply apparatus comprising:
ports respectively connected to gas sources of a plurality of types of gases containing a purging gas and a processing gas; and
a collective pipe in which the plurality of types of gases supplied from the ports are joined and flowed, wherein
a gas flow path through which gas supplied from the port connected to the gas source for the purging gas flows is formed on an uppermost stream side of the collective pipe,
wherein an uppermost stream gas valve that flows out the purging gas is arranged in a direction flowing out a flow-controlled purge gas from a diaphragm side to an anti-diaphragm side by an opening operation of a diaphragm, and a gas contact portion when the processing gas flows out to the collective pipe is limited to a central pressing part of the diaphragm and an uppermost stream end of the collective pipe does not have a dead volume.