US 12,442,083 B2
Electrode support, supporting structure, support, film coating apparatus, and application
Jian Zong, Wuxi (CN); Bixian Kang, Wuxi (CN); Fuxing Li, Wuxi (CN); and Guoman Feng, Wuxi (CN)
Assigned to JIANGSU FAVORED NANOTECHNOLOGY CO., LTD, Wuxi (CN)
Appl. No. 17/782,168
Filed by JIANGSU FAVORED NANOTECHNOLOGY CO., LTD., Wuxi (CN)
PCT Filed Apr. 24, 2020, PCT No. PCT/CN2020/086525
§ 371(c)(1), (2) Date Jun. 3, 2022,
PCT Pub. No. WO2021/109424, PCT Pub. Date Jun. 10, 2021.
Claims priority of application No. 201911227637.3 (CN), filed on Dec. 4, 2019; application No. 201911228857.8 (CN), filed on Dec. 4, 2019; application No. 201922151677.6 (CN), filed on Dec. 4, 2019; application No. 201922151761.8 (CN), filed on Dec. 4, 2019; and application No. 201922155324.3 (CN), filed on Dec. 4, 2019.
Prior Publication US 2023/0009866 A1, Jan. 12, 2023
Int. Cl. C23C 16/513 (2006.01)
CPC C23C 16/513 (2013.01) 14 Claims
OG exemplary drawing
 
1. An electrode support, configured for a film coating apparatus for forming coating on at least one to-be-coated workpiece, wherein the film coating apparatus comprises a reaction chamber body and a pulse power supply, and the pulse power supply is configured to provide a pulse electric field in the reaction chamber body; and
wherein the electrode support comprises a plurality of support members disposed in multiple layers and spaced apart by a preset spacing, and at least one layer of support member of the plurality of support members disposed in multiple layers_is conductively coupled with the pulse power supply as a cathode of the pulse power supply;
wherein at least one layer of support member of the plurality of support members disposed in multiple layers comprises a support top plate and a support bottom plate, there is a space between the support top plate and the support bottom plate, and the support bottom plate has at least one gas distribution opening, wherein the film coating apparatus comprises a gas supply part, and at least one support member forms at least part of the gas supply part, wherein the gas supply part is disposed on the plurality of support members as an anode of the pulse power supply, and the at least one gas distribution opening is evenly disposed on the plurality of support members as the anode of the pulse power supply towards a next layer of the support member of the plurality of support members disposed in multiple layers; or
at least one layer of support member of the plurality of support members disposed in multiple layers comprises a first partial support member and a second partial support member, the first partial support member is disposed above the second partial support member and disposed on the second partial support member, and the first partial support member is conductively coupled with the pulse power supply as the cathode, wherein the second partial support member is used as the gas supply part for gas distribution.