US 12,442,078 B2
Workpiece processing apparatus with gas showerhead assembly
Michael Yang, Palo Alto, CA (US); Yun Yang, Berwyn, PA (US); Manuel Sohn, Ulm (DE); Silke Hamm, Laupheim (DE); Alex Wansidler, Blaustein (DE); Dieter Hezler, Lonsee-Halzhausen (DE); and Rolf Bremensdorfer, Bibertal (DE)
Assigned to Beijing E-Town Semiconductor Technology Co., Ltd, Beijing (CN); and Mattson Technology, Inc., Fremont (CA)
Filed by Mattson Technology, Inc., Fremont, CA (US); and Beijing E-Town Semiconductor Technology Co., Ltd., Beijing (CN)
Filed on Dec. 13, 2021, as Appl. No. 17/549,102.
Claims priority of provisional application 63/129,079, filed on Dec. 22, 2020.
Prior Publication US 2022/0195601 A1, Jun. 23, 2022
Int. Cl. C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/48 (2006.01)
CPC C23C 16/45565 (2013.01) [C23C 16/45591 (2013.01); C23C 16/4584 (2013.01); C23C 16/481 (2013.01)] 14 Claims
OG exemplary drawing
 
1. A processing apparatus for processing a workpiece, the workpiece having a top side and a back side opposite from the top side, the processing apparatus comprising:
a processing chamber, having a first side and a second side opposite from the first side of the processing chamber;
a workpiece support disposed within the processing chamber, the workpiece support configured to support the workpiece, wherein the back side of the workpiece faces the workpiece support;
a gas delivery system configured to flow one or more process gases into the processing chamber from the first side of the processing chamber through a gas showerhead assembly, the gas showerhead assembly comprising an enclosure having a top cover and a plurality of gas injection apertures, wherein the gas delivery system comprises a first radial gas distribution channel and a first radial gas injection barrier, wherein gas flowing radially around the first radial gas distribution channel can diffuse or flow through one or more gas diffusion apertures disposed in the first radial gas injection barrier, the gas diffusion apertures configured to facilitate horizontal flow of the one or more process gases; and
one or more radiative heat sources configured to heat the workpiece;
wherein the gas showerhead assembly is transparent to electromagnetic radiation emitted from the one or more radiative heat sources;
wherein the gas showerhead assembly comprises a gas distribution plate, the gas distribution plate including a plurality of gas diffusion barriers disposed generally perpendicular to a horizontal axis of the gas distribution plate such that each of the plurality of gas diffusion barriers extends from the gas distribution plate to a region between the gas distribution plate and the top cover of the enclosure such that gaps are between each of the gas diffusion barriers and the top cover of the enclosure; and
wherein the gas showerhead assembly further comprises a gas injection port located radially outward of the first radial gas distribution channel, wherein the gas injection port is configured to provide the one or more process gases into the enclosure.