US 12,442,073 B2
Apparatus, systems, and methods of using an atmospheric epitaxial deposition transfer chamber
Thomas Ackermann, Feichten (DE); and Robert Huber, Feichten (DE)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Oct. 26, 2022, as Appl. No. 18/049,906.
Prior Publication US 2024/0141483 A1, May 2, 2024
Int. Cl. C23C 16/44 (2006.01); C23C 16/52 (2006.01); C30B 25/14 (2006.01)
CPC C23C 16/4408 (2013.01) [C23C 16/52 (2013.01); C30B 25/14 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of using a transfer chamber of a substrate processing system, comprising:
receiving via a user interface, user input indicating for the substrate processing system to conduct a service recovery operation for the transfer chamber according to a set of parameters that includes a base pressure and a backfill pressure;
operating, for each cycle of a quantity of pump-purge cycles, a vacuum pump according to the base pressure for the transfer chamber to reduce a quantity of gas in the transfer chamber;
directing, for each cycle of the quantity of pump-purge cycles and after operating the vacuum pump, a purge gas to the transfer chamber according to the backfill pressure;
directing, after the quantity of cycles is complete, the purge gas into the transfer chamber until a threshold pressure is satisfied; and
displaying, via the user interface, an indication that the service recovery operation for the transfer chamber is complete.