US 12,441,965 B2
Treatment liquid and substrate washing method
Yasuo Sugishima, Shizuoka (JP); and Atsushi Mizutani, Shizuoka (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Jan. 24, 2023, as Appl. No. 18/158,544.
Application 18/158,544 is a continuation of application No. PCT/JP2021/023966, filed on Jun. 24, 2021.
Claims priority of application No. 2020-128876 (JP), filed on Jul. 30, 2020; and application No. 2021-026410 (JP), filed on Feb. 22, 2021.
Prior Publication US 2023/0212485 A1, Jul. 6, 2023
Int. Cl. C11D 3/26 (2006.01); C11D 3/18 (2006.01); C11D 3/20 (2006.01); C11D 3/30 (2006.01); C11D 3/32 (2006.01); C11D 7/24 (2006.01); C11D 7/26 (2006.01); C11D 7/32 (2006.01); C11D 7/50 (2006.01); H01L 21/02 (2006.01)
CPC C11D 7/5022 (2013.01) [C11D 3/184 (2013.01); C11D 3/2044 (2013.01); C11D 3/30 (2013.01); C11D 7/244 (2013.01); C11D 7/261 (2013.01); C11D 7/267 (2013.01); C11D 7/3209 (2013.01); C11D 7/3218 (2013.01); C11D 7/50 (2013.01); H01L 21/02057 (2013.01); C11D 2111/22 (2024.01)] 20 Claims
OG exemplary drawing
 
1. A treatment liquid for a semiconductor device, comprising:
water;
a basic compound;
hexylene glycol; and
a compound A that is at least one kind selected from the group consisting of isobutene, (E)-2-methyl-1,3-pentadiene, 4-methyl-1,3-pentadiene, 2,2,4-trimethyloxetane, 4-methyl-3-penten-2-ol, and 2,4,4,6-tetramethyl-1,3-dioxane.