US 12,441,960 B2
Cleaning liquid and method for manufacturing semiconductor device
Masato Yasui, Ibo Hyogo (JP)
Assigned to Kabushiki Kaisha Toshiba, Kawasaki (JP); and Toshiba Electronic Devices & Storage Corporation, Kawasaki (JP)
Filed by Kabushiki Kaisha Toshiba, Tokyo (JP); and Toshiba Electronic Devices & Storage Corporation, Tokyo (JP)
Filed on Feb. 23, 2023, as Appl. No. 18/113,138.
Claims priority of application No. 2022-152645 (JP), filed on Sep. 26, 2022.
Prior Publication US 2024/0124799 A1, Apr. 18, 2024
Int. Cl. C11D 1/72 (2006.01); C11D 3/30 (2006.01); C11D 7/32 (2006.01); C11D 17/00 (2006.01); H01L 21/56 (2006.01); H01L 23/00 (2006.01); H01L 23/29 (2006.01); H01L 23/31 (2006.01); H01L 23/495 (2006.01)
CPC C11D 1/72 (2013.01) [C11D 3/30 (2013.01); C11D 17/0008 (2013.01); H01L 21/565 (2013.01); H01L 23/295 (2013.01); H01L 23/3121 (2013.01); H01L 23/49579 (2013.01); H01L 24/32 (2013.01); H01L 24/83 (2013.01); C11D 2111/22 (2024.01); H01L 2224/32245 (2013.01); H01L 2224/83815 (2013.01); H01L 2224/83911 (2013.01); H01L 2924/35121 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A cleaning liquid comprising:
a glycol ether-based cleaning agent; and
a compound represented by chemical formula (1) below,

OG Complex Work Unit Chemistry
wherein R is an NH2 group or H, and n is 1 or more.