| CPC C02F 1/4608 (2013.01) [C02F 1/46109 (2013.01); C02F 1/4672 (2013.01); H05H 1/2406 (2013.01)] | 20 Claims |
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1. A water treatment device using an underwater plasma discharge, the water treatment device comprising:
an electrode structure installed in a storage space in which water is stored or in a flow space in which water flows so as to cause an underwater plasma discharge;
a power supply unit configured to supply power to the electrode structure; and
a gas supply module for supplying a gas to the storage space or the flow space such that bubbles are supplied underwater, as a discharge gas, to the electrode structure,
wherein the electrode structure includes a first electrode, a second electrode disposed opposite the first electrode, and a dielectric member disposed in a space between the first electrode and the second electrode, and
the first electrode has a first seating hole formed therein such that a part of the dielectric member is inserted and seated therein, and
the first seating hole has a bubble inflow passage disposed therein such that the bubble inflow passage is not covered by the dielectric member when the dielectric member is seated therein, and the bubbles supplied by the gas supply module through the bubble inflow passage flow into the space between the first electrode and the second electrode, thereby causing the underwater plasma discharge in the space between the first electrode and the second electrode.
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