US 12,441,620 B2
Method for producing trichlorosilane and method for producing polycrystalline silicon rod
Junya Sakai, Yamaguchi (JP); Shoji Iiyama, Yamaguchi (JP); and Kunihiko Matsumura, Yamaguchi (JP)
Assigned to Tokuyama Corporation, Yamaguchi (JP)
Appl. No. 18/834,283
Filed by Tokuyama Corporation, Yamaguchi (JP)
PCT Filed Oct. 28, 2022, PCT No. PCT/JP2022/040486
§ 371(c)(1), (2) Date Jul. 30, 2024,
PCT Pub. No. WO2023/074872, PCT Pub. Date May 4, 2023.
Claims priority of application No. 2021-178607 (JP), filed on Nov. 1, 2021.
Prior Publication US 2025/0128953 A1, Apr. 24, 2025
Int. Cl. C01B 33/107 (2006.01); C23C 16/24 (2006.01); C23C 16/54 (2006.01)
CPC C01B 33/1071 (2013.01) [C23C 16/24 (2013.01); C23C 16/545 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A method for producing trichlorosilane, the method comprising:
reacting metallic silicon and tetrachlorosilane with a mixed gas containing hydrogen to generate trichlorosilane, wherein
the mixed gas containing hydrogen contains 1 to 500 molar ppm of hydrogen chloride and 100 to 10000 molar ppm of silane hydride, and
the mixed gas is heated at 100° C. to 450° C. and then reacted.