| CPC B05C 11/101 (2013.01) [B05C 11/1013 (2013.01); B05C 11/1026 (2013.01)] | 2 Claims |
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1. A substrate treating apparatus comprising:
a housing having a treating space for treating a substrate therein;
a support unit configured to support the substrate at the treating space;
a nozzle for supplying a liquid to the substrate placed on the support unit;
a liquid supply unit configured to supply the liquid to the nozzle and have a flow meter;
a flow rate measuring unit configured to verify an error of the flow meter; and
a controller for controlling the liquid supply unit and the flow rate measuring unit,
wherein the flow rate measuring unit is provided in the treating space,
wherein the flow rate measuring unit comprises:
a cup for accommodating the liquid;
a measuring means configured to verify a level of the liquid accommodated in the cup; and
a discharge line for discharging the liquid within the cup and having a discharge valve installed thereon,
wherein the measuring means comprises
an auxillary container which is provided to communicate with an inner space of the cup at a side of the cup; and
a level sensor provided the auxiliary container and for detecting the level of the liquid accommodated in the cup,
wherein a bottom portion of the auxiliary container is located at a height corresponding to an upper portion of an inner space of the cup,
wherein the controller controls the liquid supply unit to discharge a liquid of a first amount to the cup for a first time in a state at which the discharge valve is closed, and
controls the measuring means to determine whether an error has occurred in the flow meter by determining whether the level of the liquid accommodated in the cup is the first amount.
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