US 12,440,861 B2
Chemical liquid supply unit, substrate processing apparatus having the same, and chemical liquid supply method
Joo Sung Lee, Cheonan-si (KR); Kang Suk Lee, Yongin-si (KR); and Soon Kab Kwon, Gimhae-si (KR)
Assigned to SEMES CO., LTD., Cheonan-si (KR)
Filed by SEMES CO., LTD., Cheonan-si (KR)
Filed on Nov. 23, 2022, as Appl. No. 17/992,930.
Claims priority of application No. 10-2021-0163663 (KR), filed on Nov. 24, 2021.
Prior Publication US 2023/0158533 A1, May 25, 2023
Int. Cl. H01L 21/67 (2006.01); B05B 7/04 (2006.01); B05B 7/24 (2006.01); B05B 12/00 (2018.01); B05B 12/14 (2006.01); B05B 14/00 (2018.01)
CPC B05B 14/00 (2018.02) [B05B 7/0408 (2013.01); B05B 7/2486 (2013.01); B05B 12/00 (2013.01); B05B 12/1418 (2013.01); H01L 21/67023 (2013.01); H01L 21/6715 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A chemical liquid supply unit comprising:
a chemical liquid supply source configured to supply a chemical liquid;
a first flow rate chemical liquid supply line connected to the chemical liquid supply source and configured to receive the chemical liquid from the chemical liquid supply source and supply the chemical liquid at a first flow rate to a nozzle unit of a substrate processing apparatus;
a second flow rate chemical liquid supply line connected to the chemical liquid supply source and configured to:
receive the chemical liquid at the first flow rate from the chemical liquid supply source, and
adjust a flow rate of the chemical liquid supplied to the nozzle unit of the substrate processing apparatus at a second flow rate, wherein an end of the first flow rate chemical liquid supply line and an end of the second flow rate chemical liquid supply line are connected with each other and the connected ends of the first flow rate chemical liquid supply line and the second flow rate chemical liquid supply line are connected to the nozzle unit;
an excess chemical liquid drain line configured to drain an excess chemical liquid except for the chemical liquid of the second flow rate from the supplied chemical liquid from the chemical liquid supply source according to adjustment of the flow rate of the chemical liquid through the second flow rate chemical liquid supply line; and
a controller configured to:
selectively control chemical liquid supply of the first flow rate chemical liquid supply line and the second flow rate chemical liquid supply line so that one of the first flow rate chemical liquid supply line and the second flow rate chemical liquid supply line supplies the chemical liquid to the nozzle unit, and
control the second flow rate chemical liquid supply line to adjust the flow rate of the chemical liquid to supply the chemical liquid at the second flow rate to the nozzle unit,
wherein the second flow rate is different from the first flow rate.