	US 12,114,534 B2
	OLED display substrate, manufacturing method thereof, and display device
Liman Peng, Beijing (CN); Qi Liu, Beijing (CN); Liangliang Liu, Beijing (CN); Jianqiang Wang, Beijing (CN); Yan Wu, Beijing (CN); and Jin Yang, Beijing (CN)
Assigned to ORDOS YUANSHENG OPTOELECTRONICS CO., LTD ., Ordos (CN); and BOE TECHNOLOGY GROUP CO., LTD, Beijing (CN)
Appl. No. 17/041,162
Filed by ORDOS YUANSHENG OPTOELECTRONICS CO., LTD., Inner Mongolia (CN); and BOE TECHNOLOGY GROUP CO., LTD., Beijing (CN)
PCT Filed Apr. 29, 2020, PCT No. PCT/CN2020/087796 § 371(c)(1), (2) Date Sep. 24, 2020, PCT Pub. No. WO2020/253396, PCT Pub. Date Dec. 24, 2020.
Claims priority of application No. 201910544755.0 (CN), filed on Jun. 21, 2019.
Prior Publication US 2023/0098150 A1, Mar. 30, 2023
Int. Cl. H10K 59/122 (2023.01); H10K 71/00 (2023.01); H10K 50/11 (2023.01); H10K 59/12 (2023.01); H10K 59/35 (2023.01); H10K 71/16 (2023.01)

CPC H10K 59/122 (2023.02) [H10K 71/00 (2023.02); H10K 50/11 (2023.02); H10K 59/1201 (2023.02); H10K 59/35 (2023.02); H10K 71/166 (2023.02)]

4 Claims

1. An OLED display substrate having a display area and an edge area surrounding the display area, the OLED display substrate comprising a back plate and a pixel-defining layer on the back plate,

wherein the OLED display substrate comprises a transistor array layer, and the transistor array layer extends to the edge area;

at the edge area of the OLED display substrate, an auxiliary spacer is provided on the pixel-defining layer, and the pixel-defining layer covers the transistor array layer at the edge area;

at the display area of the OLED display substrate, a spacer is further provided on the pixel-defining layer, and the auxiliary spacer at the edge area is made of the same material as the spacer and is fabricated through a single patterning process with the spacer; and

the height difference between an end face of the spacer away from the back plate and an end face of the auxiliary spacer away from the back plate is not greater than 3 μm.