CPC H01L 27/1463 (2013.01) [H01L 27/14612 (2013.01); H01L 27/14621 (2013.01); H01L 27/14627 (2013.01); H01L 27/14636 (2013.01); H01L 27/14831 (2013.01)] | 20 Claims |
1. An image sensor comprising:
a first pixel region and a second pixel region located within a semiconductor substrate, wherein each of the first pixel region and the second pixel region include a photoelectric conversion device;
a first isolation layer entirely surrounding the first pixel region and the second pixel region;
a second isolation layer located between the first pixel region and the second pixel region; and
a microlens arranged on the first pixel region and the second pixel region,
wherein the second isolation layer comprises at least one first open region that exposes a portion of an area located between the first pixel region and the second pixel region.
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