US 12,112,960 B2
Apparatus for processing substrate and method of determining whether substrate treatment process is normal
Ohyeol Kwon, Cheonan-si (KR); Soo Yeon Shin, Suwon-si (KR); Hyun Hoo Kim, Cheonan-si (KR); and Myung Chan Cho, Anyang-si (KR)
Assigned to SEMES CO., LTD., Cheonan-si (KR)
Filed by SEMES CO., LTD., Cheonan-si (KR)
Filed on Sep. 14, 2021, as Appl. No. 17/474,469.
Claims priority of application No. 10-2020-0120202 (KR), filed on Sep. 18, 2020.
Prior Publication US 2022/0093430 A1, Mar. 24, 2022
Int. Cl. G06T 7/00 (2017.01); G06N 3/045 (2023.01); H01L 21/67 (2006.01)
CPC H01L 21/67253 (2013.01) [G06N 3/045 (2023.01); G06T 7/0004 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/20084 (2013.01); G06T 2207/30148 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A method for determining whether a substrate treatment process is normal using a deep learning model, the method comprising:
receiving an input image of a substrate processing;
preprocessing the input image;
choosing a recognized tip area of a nozzle as a region of interest (ROI);
learning the preprocessed input image by using a deep learning model; and
comparing a real time substrate treatment process image and a learned data by using the trained deep learning model to determine whether the substrate treatment process is normal,
wherein the preprocessing the input image comprises recognizing the tip area of a nozzle in the input image of the substrate processing, a chemical being sprayed from the tip area of the nozzle from which a chemical is to be sprayed,
wherein the learning the preprocessed input image by using the deep learning model comprises learning the ROI according to flow rates of the chemical.