US 12,112,918 B2
Dual source injector with switchable analyzing magnet
Wilhelm Platow, Newburyport, MA (US); and Neil Bassom, Hamilton, MA (US)
Assigned to Axcelis Technologies, Inc., Beverly, MA (US)
Filed by Axcelis Technologies, Inc., Beverly, MA (US)
Filed on Oct. 4, 2023, as Appl. No. 18/481,111.
Application 18/481,111 is a continuation of application No. 17/705,503, filed on Mar. 28, 2022, granted, now 11,823,858.
Prior Publication US 2024/0029998 A1, Jan. 25, 2024
Int. Cl. H01J 37/317 (2006.01); G21K 5/04 (2006.01); H01J 37/147 (2006.01); H01L 21/04 (2006.01)
CPC H01J 37/3171 (2013.01) [G21K 5/04 (2013.01); H01J 37/1475 (2013.01); H01L 21/0415 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An ion implantation system comprising:
a mass analyzing magnet comprising a yoke and a coil defining a first entrance, a second entrance, and an exit of the mass analyzing magnet;
a first ion source configured to define a first ion beam directed toward the first entrance of the mass analyzing magnet along a first beam path;
a second ion source configured to define a second ion beam directed toward the second entrance of the mass analyzing magnet along a second beam path; and
a magnet current source configured to supply a magnet current to the mass analyzing magnet; and
magnet control circuitry coupled to the mass analyzing magnet and magnet current source, wherein the magnet control circuitry is configured to selectively control a polarity of the magnet current supplied to the mass analyzing magnet based on a selective formation of each of the first ion beam and the second ion beam, wherein the mass analyzing magnet is configured to mass analyze the first ion beam and second ion beam, respectively, thereby defining a mass analyzed ion beam at the exit of the mass analyzing magnet along a mass analyzed beam path.