US 12,112,784 B2
Magnetoresistive random access memory device
Sungchul Lee, Osan-si (KR); and Kyungjin Lee, Seoul (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed by SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed on May 24, 2022, as Appl. No. 17/751,898.
Claims priority of application No. 10-2021-0123786 (KR), filed on Sep. 16, 2021.
Prior Publication US 2023/0079682 A1, Mar. 16, 2023
Int. Cl. G11C 11/00 (2006.01); G11C 11/16 (2006.01); H10B 61/00 (2023.01); H10N 50/10 (2023.01); H10N 50/80 (2023.01); H10N 50/85 (2023.01)
CPC G11C 11/161 (2013.01) [H10B 61/00 (2023.02); H10N 50/10 (2023.02); H10N 50/80 (2023.02); H10N 50/85 (2023.02)] 20 Claims
OG exemplary drawing
 
20. A magnetoresistive random access memory device, comprising:
a metal oxide layer pattern;
a ferromagnetic pattern directly contacting an upper surface of the metal oxide layer pattern, and the ferromagnetic pattern including a horizontal magnetic material;
a non-magnetic pattern directly contacting an upper surface of the ferromagnetic pattern, the non-magnetic pattern including a non-magnetic metal material;
a free layer pattern directly contacting a portion of an upper surface of the non-magnetic pattern, the free layer pattern having a magnetization direction perpendicular to the upper surface of the non-magnetic pattern, and the magnetization direction being changeable in response to spin currents generated in a stacked structure including the metal oxide layer pattern, the ferromagnetic pattern, and the non-magnetic pattern;
a tunnel barrier pattern on the free layer pattern; and
a pinned layer pattern on the tunnel barrier pattern, the pinned layer pattern having a magnetization direction in a vertical direction that is fixed;
wherein:
the spin currents are generated as an in-plane current is applied to the stacked structure including the metal oxide layer pattern, the ferromagnetic pattern, and the non-magnetic pattern, and
the spin currents include a spin current generated by a spin Hall effect, a first interface spin current generated at a first interface between the metal oxide layer pattern and the ferromagnetic pattern, and a second interface spin current generated at a second interface between the ferromagnetic pattern and the non-magnetic pattern.