US 12,111,579 B2
Method and apparatus for evaluating an unknown effect of defects of an element of a photolithography process
Alexander Freytag, Erfurt (DE); Christoph Husemann, Jena (DE); Dirk Seidel, Jena-Leutra (DE); and Carsten Schmidt, Jena (DE)
Assigned to Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed by Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed on Sep. 1, 2023, as Appl. No. 18/241,578.
Application 18/241,578 is a continuation of application No. 17/087,970, filed on Nov. 3, 2020, granted, now 11,774,859.
Application 17/087,970 is a continuation of application No. PCT/EP2019/062646, filed on May 16, 2019.
Claims priority of application No. 102018207880.7 (DE), filed on May 18, 2018.
Prior Publication US 2023/0408929 A1, Dec. 21, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. G01J 3/00 (2006.01); G03F 7/00 (2006.01); G06F 30/20 (2020.01); G06N 3/08 (2023.01); G06N 20/00 (2019.01); G06T 7/00 (2017.01); G06V 10/75 (2022.01); G06V 10/774 (2022.01); G06V 20/13 (2022.01)
CPC G03F 7/705 (2013.01) [G06F 30/20 (2020.01); G06N 3/08 (2013.01); G06N 20/00 (2019.01); G06T 7/0006 (2013.01); G06T 7/001 (2013.01); G06V 10/751 (2022.01); G06V 10/774 (2022.01); G06V 20/13 (2022.01); G06T 2207/10032 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/20084 (2013.01); G06T 2207/30148 (2013.01)] 26 Claims
OG exemplary drawing
 
1. A method for determining at least one unknown effect of defects of an element of a photolithography process, wherein the method comprises the steps of:
a. providing a model of machine learning for a relationship between an image, design data associated with the image and at least one effect of the defects of the element of the photolithography process arising from the image;
b. training the model of machine learning using a multiplicity of images used for training purposes, design data associated with the images used for training purposes and corresponding effects of the defects; and
c. determining the at least one unknown effect of the defects by applying the trained model of machine learning to a measured image and the design data associated with the measured image.