CPC G03F 7/70166 (2013.01) [G02B 5/0891 (2013.01); G02B 5/1861 (2013.01); G03F 7/70191 (2013.01); G03F 7/702 (2013.01)] | 24 Claims |
17. A method, comprising:
structuring a structuring layer applied on a substrate of a mirror body; and
structuring the substrate of the mirror body,
wherein structuring the substrate of the mirror body comprises at least one member selected from the group consisting of:
etching with an etching angle in the range of 0° to 60°;
etching, wherein the structuring layer and the substrate of the mirror body have different etching rates; and
etching, wherein the structuring layer is provided with a sidewall steepness in the range of 10° to 90° during the structuring; and
applying a closed protective layer on the substrate,
wherein:
the grating structure comprises a plurality of grating ridges;
for each grating ridge, the grating ridges comprises a front side and sidewalls;
for each of at least some pairs of adjacent grating ridges:
a groove comprising a bottom is between the adjacent grating ridges;
a depth of the groove is a distance between the bottom and the adjacent grating ridges; and
the depth of the groove is configured to mask out infrared radiation; and
the grating structure has a maximum edge steepness in the range of 15° to 60°.
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