US 12,111,577 B2
Line narrowing device, electronic device manufacturing method
Takahito Kumazaki, Oyama (JP); and Osamu Wakabayashi, Oyama (JP)
Assigned to Gigaphoton Inc., Tochigi (JP)
Filed by Gigaphoton Inc., Tochigi (JP)
Filed on Aug. 10, 2022, as Appl. No. 17/818,916.
Application 17/818,916 is a continuation of application No. PCT/JP2020/012546, filed on Mar. 19, 2020.
Prior Publication US 2022/0385027 A1, Dec. 1, 2022
Int. Cl. G03F 7/00 (2006.01); H01S 3/08 (2023.01); H01S 3/106 (2006.01)
CPC G03F 7/70025 (2013.01) [H01S 3/08009 (2013.01); H01S 3/106 (2013.01)] 20 Claims
OG exemplary drawing
 
19. An electronic device manufacturing method comprising:
generating a pulse laser beam with a laser apparatus;
emitting the pulse laser beam to an exposure apparatus; and
exposing a photosensitive substrate to the pulse laser beam in the exposure apparatus to manufacture an electronic device,
the laser apparatus including a laser chamber and an optical resonator including a line narrowing device, and
the line narrowing device including
first and second prisms disposed at positions different in a wavelength dispersion direction of any of the first and second prisms,
a third prism that is disposed on an optical path of an optical beam and through which a beam width of the optical beam is enlarged, a first part of the optical beam is incident on the first prism, and a second part of the optical beam is incident on the second prism,
a grating disposed across an optical path of the first part having passed through the first prism and an optical path of the second part having passed through the second prism,
a first actuator configured to adjust an incident angle of the first part on the grating,
a second actuator configured to adjust an incident angle of the second part on the grating, and
a third actuator configured to adjust an energy ratio of the first part and the second part.