US 12,111,572 B2
Methods of greytone imprint lithography to fabricate optical devices
Hao Tang, San Jose, CA (US); Kang Luo, Santa Clara, CA (US); Erica Chen, Cupertino, CA (US); and Yongan Xu, Santa Clara, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Jun. 12, 2023, as Appl. No. 18/333,290.
Application 18/333,290 is a continuation of application No. 17/740,116, filed on May 9, 2022, granted, now 11,709,423.
Claims priority of provisional application 63/186,319, filed on May 10, 2021.
Prior Publication US 2023/0341769 A1, Oct. 26, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/00 (2006.01); G02B 5/18 (2006.01)
CPC G03F 7/0005 (2013.01) [G02B 5/1857 (2013.01); G03F 7/0002 (2013.01)] 20 Claims
OG exemplary drawing
 
15. A method of imprinting a pattern on a substrate, the method comprising:
forming a first pattern on a plurality of die on each of a plurality of masters using a method other than imprinting, the first pattern on each die including a plurality of patterned features;
measuring the patterned features at a plurality of locations on each die on each of the masters;
selecting a first die on a first master of the plurality of masters based on the measurements of the patterned features on each die of each of the masters;
using the first die on the first master to form a second pattern on a first imprint template;
imprinting the first pattern on each die of a plurality of die of a new master with the first imprint template; and
using the plurality of die on the new master to form the second pattern on each die of a plurality of die on a second imprint template.