CPC F04D 19/048 (2013.01) [F04D 29/32 (2013.01); F04D 29/38 (2013.01); F04D 29/542 (2013.01)] | 13 Claims |
1. An axial flow vacuum pump for evacuating a chamber in a semiconductor manufacturing process, the axial flow vacuum pump comprising:
a rotor having a plurality of rotor blades; and
a stator having a plurality of stator blades, wherein the rotor blades and stator blades have a curved aerofoil cross-sectional shape comprising a curved leading edge, a pointed trailing edge, a concaved pressure surface extending from the leading edge to the trailing edge and a curved suction surface extending from the leading edge to the trailing edge, wherein the concaved pressure surface of each rotor faces in a direction of rotation of the rotor;
wherein an inlet stage of the pump comprises blades having a first radial length and an adjacent downstream stage of the pump comprises blades having a second radial length, wherein the ratio of first radial length to second radial length is 2:1 or greater.
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