US 12,110,591 B2
Susceptor arrangement of a CVD reactor
Francisco Ruda Y Witt, Eschweiler (DE); Marcel Kollberg, Würselen (DE); and Hendrik Rauf, Aachen (DE)
Assigned to AIXTRON SE, Herzogenrath (DE)
Appl. No. 17/593,081
Filed by AIXTRON SE, Herzogenrath (DE)
PCT Filed Feb. 28, 2020, PCT No. PCT/EP2020/055308
§ 371(c)(1), (2) Date Sep. 8, 2021,
PCT Pub. No. WO2020/182495, PCT Pub. Date Sep. 17, 2020.
Claims priority of application No. 10 2019 105 913.5 (DE), filed on Mar. 8, 2019.
Prior Publication US 2022/0186374 A1, Jun. 16, 2022
Int. Cl. C23C 16/458 (2006.01); C23C 16/46 (2006.01); H01L 21/687 (2006.01)
CPC C23C 16/46 (2013.01) [C23C 16/4584 (2013.01); C23C 16/4585 (2013.01); H01L 21/68735 (2013.01); H01L 21/68757 (2013.01); H01L 21/68771 (2013.01); H01L 21/68785 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A susceptor arrangement, comprising:
a substrate holder (4);
at least one covering element (5, 15) comprising a lowermost covering plate (6, 16, 36) and an uppermost covering plate (7, 17);
a circular or annular susceptor (2) with a first broad side surface (3), on which the substrate holder (4) and the at least one covering element (5, 15) are arranged, wherein the lowermost covering plate (6, 16, 36) adjoins the first broad side surface (3) of the susceptor (2), and wherein the covering element (5, 15) forms a plate stack in which the uppermost covering plate (7, 17) lies completely on the lowermost covering plate (6, 16, 36) and forms a free broad side surface (14) of the susceptor arrangement; and
at least one positioning element (8, 18) inserted through both a respective opening (12, 13) of the lowermost covering plate (6, 16, 36) and through or into a respective opening (9, 10, 19) of the uppermost covering plate (7, 17), with which the uppermost covering plate (7, 17) is secured to the lowermost covering plate (6, 16, 36).