US 12,110,590 B2
Faceplate having a curved surface
Shailendra Srivastava, Fremont, CA (US); Sai Susmita Addepalli, San Jose, CA (US); Nikhil Sudhindrarao Jorapur, Sunnyvale, CA (US); Daemian Raj Benjamin Raj, Fremont, CA (US); Amit Kumar Bansal, Milpitas, CA (US); Juan Carlos Rocha-Alvarez, San Carlos, CA (US); Gregory Eugene Chichkanoff, Mountain View, CA (US); Xinhai Han, Santa Clara, CA (US); Masaki Ogata, San Jose, CA (US); Kristopher Enslow, San Jose, CA (US); and Wenjiao Wang, San Jose, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Oct. 18, 2023, as Appl. No. 18/381,534.
Application 18/381,534 is a continuation of application No. 18/083,173, filed on Dec. 16, 2022, granted, now 11,851,759.
Application 18/083,173 is a continuation of application No. 16/894,355, filed on Jun. 5, 2020, granted, now 11,530,482, issued on Dec. 20, 2022.
Claims priority of provisional application 62/858,772, filed on Jun. 7, 2019.
Prior Publication US 2024/0044000 A1, Feb. 8, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/50 (2006.01); H01J 37/32 (2006.01)
CPC C23C 16/45565 (2013.01) [C23C 16/45536 (2013.01); C23C 16/4583 (2013.01); C23C 16/50 (2013.01); H01J 37/3244 (2013.01); H01J 37/32458 (2013.01); H01J 2237/3321 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A faceplate for a process chamber, the faceplate comprising:
a first surface;
a second surface opposite the first surface, the second surface configured to be exposed to a processing volume of the process chamber, the second surface including a first curved region having a first peak centered at and symmetric with respect to a vertical centerline of the faceplate; and
a plurality of apertures comprising first and second apertures extending through the faceplate from the first surface to the first curved region of the second surface,
wherein the first curved region has a non-negative slope from an outermost edge of the faceplate to a center of the faceplate, and the second apertures are radially outward of the first apertures with respect to the vertical centerline of the faceplate.