US 12,110,547 B2
Selective surface patterning via nanoimprinting
Andrew A. Brown, Cambridge (GB); Wayne N. George, Ilford (GB); Alexandre Richez, Cambridge (GB); and M. Shane Bowen, Encinitas, CA (US)
Assigned to Illumina, Inc., San Diego, CA (US)
Filed by Illumina, Inc., San Diego, CA (US)
Filed on Sep. 25, 2020, as Appl. No. 17/033,237.
Application 17/033,237 is a division of application No. 15/739,688, granted, now 10,808,282, previously published as PCT/US2016/040951, filed on Jul. 5, 2016.
Claims priority of provisional application 62/189,662, filed on Jul. 7, 2015.
Prior Publication US 2021/0010080 A1, Jan. 14, 2021
Int. Cl. G01N 33/53 (2006.01); C12Q 1/6874 (2018.01); G03F 7/00 (2006.01); G03F 7/16 (2006.01); B01L 3/00 (2006.01); G01N 21/64 (2006.01)
CPC C12Q 1/6874 (2013.01) [G03F 7/0002 (2013.01); G03F 7/161 (2013.01); B01L 3/5085 (2013.01); B01L 2200/12 (2013.01); B01L 2300/0819 (2013.01); B01L 2300/0829 (2013.01); B01L 2300/161 (2013.01); G01N 21/645 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A system, comprising:
a substrate having a surface;
a first polymer layer disposed on the substrate surface, wherein the first polymer layer comprises a first plurality of functional groups and further comprises an imprinted pattern of features; and
a second polymer layer disposed over at least a portion of the first polymer layer;
wherein the first plurality of functional groups provide reactive sites for covalent bonding of a functionalized molecule and the second polymer layer comprises a second plurality of functional groups that differ from the first plurality of functional groups;
wherein a first region of the system is defined where the first polymer layer is exposed; and
wherein a second region of the system is defined where the second polymer layer is exposed.