US 12,110,372 B2
Aromatic polyamide films for transparent flexible substrates
Limin Sun, Copley, OH (US); Frank W. Harris, Boca Raton, FL (US); Jiaokai Jing, Uniontown, OH (US); Haci B. Erdem, Akron, OH (US); John D. Harvey, Seville, OH (US); and Dong Zhang, Uniontown, OH (US)
Assigned to Akron Polymer Systems, Inc., Akron, OH (US)
Filed by Akron Polymer Systems, Inc., Akron, OH (US)
Filed on Jun. 28, 2021, as Appl. No. 17/360,733.
Application 17/360,733 is a continuation of application No. 15/284,024, filed on Oct. 3, 2016, granted, now 11,046,825.
Application 15/284,024 is a continuation of application No. 13/172,564, filed on Jun. 29, 2011, granted, now 9,457,496.
Claims priority of provisional application 61/466,751, filed on Mar. 23, 2011.
Prior Publication US 2022/0267539 A1, Aug. 25, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. C08J 5/18 (2006.01); B29C 35/02 (2006.01); B29C 39/14 (2006.01); B29C 41/24 (2006.01); B32B 17/06 (2006.01); B32B 17/10 (2006.01); B32B 27/34 (2006.01); C08G 69/32 (2006.01); C09D 177/10 (2006.01); B29K 77/00 (2006.01); B29L 7/00 (2006.01); B29L 31/34 (2006.01)
CPC C08J 5/18 (2013.01) [B29C 35/02 (2013.01); B29C 39/14 (2013.01); B29C 41/24 (2013.01); B32B 17/06 (2013.01); B32B 17/10 (2013.01); B32B 27/34 (2013.01); C08G 69/32 (2013.01); C09D 177/10 (2013.01); B29K 2077/00 (2013.01); B29K 2077/10 (2013.01); B29K 2995/0026 (2013.01); B29L 2007/008 (2013.01); B29L 2031/3475 (2013.01); B32B 2457/206 (2013.01); C08J 2377/10 (2013.01); Y10T 428/24975 (2015.01); Y10T 428/265 (2015.01)] 8 Claims
 
1. A transparent film having a glass transition temperature greater than approximately 300° C. and a coefficient of thermal expansion of less than approximately 20 ppm/° C., consisting essentially of an aromatic copolyamide characterized by:
at least two repeat structures, wherein one of the repeat structures is repeat structure (V)

OG Complex Work Unit Chemistry
wherein n=1 to 4;
where Y is the molar ratio of the repeat structure (V) with respect to all other repeat structures, and Y is from 0.01 to 0.10;
wherein Ar1 is selected from the group comprising:

OG Complex Work Unit Chemistry
wherein p=4, q=3, and wherein R1, R2, R3, R4, R5 are selected from the group comprising hydrogen, halogen (fluoride, chloride, bromide, and iodide), alkyl, substituted alkyl such as halogenated alkyls, nitro, cyano, thioalkyl, alkoxy, substituted alkoxy such as a halogenated alkoxy, aryl, or substituted aryl such as halogenated aryls, alkyl ester and substituted alkyl esters, and combinations thereof, wherein G1 is selected from a group comprising a covalent bond; a CH2 group; a C(CH3)2 group; a C(CF3)2 group; a C(CX3)2 group, wherein X is a halogen; a CO group; an O atom; a S atom; a SO2 group; a Si(CH3)2 group; 9, 9-fluorene group; substituted 9, 9-fluorene; and an OZO group, wherein Z is a aryl group or substituted aryl group, such as phenyl group, biphenyl group, perfluorobiphenyl group, 9, 9-bisphenylfluorene group, and substituted 9, 9-bisphenylfluorene;
wherein Ar2 is selected from the group comprising:

OG Complex Work Unit Chemistry
wherein p=4, wherein R6, R7, R8 are selected from the group comprising hydrogen, halogen (fluoride, chloride, bromide, and iodide), alkyl, substituted alkyl such as halogenated alkyls, nitro, cyano, thioalkyl, alkoxy, substituted alkoxy such as a halogenated alkoxy, aryl, substituted aryl such as halogenated aryls, alkyl ester, and substituted alkyl esters, and combinations thereof, wherein G2 is selected from a group comprising a covalent bond; a CH2 group; a C(CH3)2 group; a C(CF3)2 group; a C(CX3)2 group, wherein X is a halogen; a CO group; an O atom; a S atom; a SO2 group; a Si(CH3)2 group; 9, 9-fluorene group; substituted 9, 9-fluorene; and an OZO group, wherein Z is a aryl group or substituted aryl group, such as phenyl group, biphenyl group, perfluorobiphenyl group, 9, 9-bisphenylfluorene group, and substituted 9, 9-bisphenylfluorene;
wherein Ar3 is selected from the group comprising:

OG Complex Work Unit Chemistry
wherein m=1 or 2, wherein t=1 to 3, wherein R9, R10, R11 are selected from the group comprising hydrogen, halogen (fluoride, chloride, bromide, and iodide), alkyl, substituted alkyl such as halogenated alkyls, nitro, cyano, thioalkyl, alkoxy, substituted alkoxy such as halogenated alkoxy, aryl, substituted aryl such as halogenated aryls, alkyl ester, and substituted alkyl esters, and combinations thereof, wherein G3 is selected from a group comprising a covalent bond; a CH2 group; a C(CH3)2 group; a C(CF3)2 group; a C(CX3)2 group, wherein X is a halogen; a CO group; an O atom; a S atom; a SO2 group; a Si(CH3)2 group; 9, 9-fluorene group; substituted 9, 9-fluorene; and an OZO group, wherein Z is a aryl group or substituted aryl group, such as phenyl group, biphenyl group, perfluorobiphenyl group, 9, 9-bisphenylfluorene group, and substituted 9, 9-bisphenylfluorene.