US 12,109,641 B2
Optical device having structural and refractive index gradation, and method of fabricating the same
Kang Luo, Santa Clara, CA (US); Ludovic Godet, Sunnyvale, CA (US); Daihua Zhang, Los Altos, CA (US); Nai-Wen Pi, Santa Clara, CA (US); Jinrui Guo, San Jose, CA (US); and Rami Hourani, Santa Clara, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Nov. 17, 2021, as Appl. No. 17/455,288.
Claims priority of provisional application 63/114,919, filed on Nov. 17, 2020.
Prior Publication US 2022/0152724 A1, May 19, 2022
Int. Cl. B23K 10/00 (2006.01); F21V 8/00 (2006.01)
CPC B23K 10/00 (2013.01) [G02B 6/0016 (2013.01); G02B 6/0036 (2013.01)] 25 Claims
OG exemplary drawing
 
1. A method of forming a waveguide structure, comprising:
expelling plasma from an applicator having a head toward a plurality of grating structures formed on a substrate, the plasma formed at atmospheric pressure in the head;
changing a depth of the plurality of grating structures with the plasma by removing grating material from the plurality of grating structures, and
depositing an overlayer over and in contact with the grating structures and to form a surface profile of the overlayer, the surface profile having a surface angle defining a slope with respect to the substrate.