US 12,109,580 B2
Processing liquid nozzle and cleaning apparatus
Daisuke Goto, Kumamoto (JP); Katsuhiro Morikawa, Kumamoto (JP); and Takahiro Koga, Kumamoto (JP)
Assigned to TOKYO ELECTRON LIMITED, Tokyo (JP)
Appl. No. 17/763,371
Filed by Tokyo Electron Limited, Tokyo (JP)
PCT Filed Sep. 14, 2020, PCT No. PCT/JP2020/034618
§ 371(c)(1), (2) Date Mar. 24, 2022,
PCT Pub. No. WO2021/060036, PCT Pub. Date Apr. 1, 2021.
Claims priority of application No. 2019-174136 (JP), filed on Sep. 25, 2019.
Prior Publication US 2022/0371041 A1, Nov. 24, 2022
Int. Cl. B05B 17/06 (2006.01); B08B 3/02 (2006.01); B08B 3/08 (2006.01); B08B 3/12 (2006.01); B08B 5/02 (2006.01); B08B 5/04 (2006.01); B08B 13/00 (2006.01)
CPC B05B 17/0676 (2013.01) [B08B 3/022 (2013.01); B08B 3/08 (2013.01); B08B 3/123 (2013.01); B08B 5/02 (2013.01); B08B 5/04 (2013.01); B08B 13/00 (2013.01); B08B 2203/0217 (2013.01); B08B 2203/0288 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A processing liquid nozzle comprising:
an ultrasonic wave generator including an oscillator that generates ultrasonic waves and an oscillating body that is connected to the oscillator;
a first supply flow path configured to supply a first liquid to a point contacting the oscillating body of the ultrasonic wave generator;
an ejection flow path configured to supply the first liquid to which the ultrasonic waves are applied by the ultrasonic wave generator to an ejection port; and
a second supply flow path connected to the ejection flow path on a downstream side from the ultrasonic wave generator and configured to supply a second liquid to the ejection flow path,
wherein the oscillating body is provided at an upstream end of the ejection flow path and extends into the ejection flow path such that the first supply flow path directly supplies the first liquid to the point contacting the oscillating body upon exiting the first supply flow path.