US 11,782,349 B2
Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus
Weitian Kou, Eindhoven (NL); Alexander Ypma, Veldhoven (NL); Marc Hauptmann, Turnhout (BE); Michiel Kupers, Roermond (NL); Lydia Marianna Vergaij-Huizer, Eindhoven (NL); Erik Johannes Maria Wallerbos, Helmond (NL); Erik Henri Adriaan Delvigne, Breda (NL); Willem Seine Christian Roelofs, Deurne (NL); Hakki Ergün Cekli, Singapore (SG); Stefan Cornelis Theodorus Van Der Sanden, Nijmegen (NL); Cédric Désiré Grouwstra, Eindhoven (NL); David Frans Simon Deckers, Turnhout (BE); Manuel Giollo, Eindhoven (NL); and Iryna Dovbush, Eindhoven (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
Filed on Jan. 24, 2023, as Appl. No. 18/100,662.
Application 18/100,662 is a continuation of application No. 17/715,112, filed on Apr. 7, 2022, granted, now 11,592,753.
Application 17/715,112 is a continuation of application No. 17/102,850, filed on Nov. 24, 2020, granted, now 11,327,407.
Application 17/102,850 is a continuation of application No. 16/335,277, granted, now 10,877,381, previously published as PCT/EP2017/074643, filed on Sep. 28, 2017.
Claims priority of application No. 16195047 (EP), filed on Oct. 21, 2016; application No. 17150658 (EP), filed on Jan. 9, 2017; application No. 17154129 (EP), filed on Feb. 1, 2017; and application No. 17187411 (EP), filed on Aug. 23, 2017.
Prior Publication US 2023/0168591 A1, Jun. 1, 2023
Int. Cl. G03F 7/20 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/70508 (2013.01) [G03F 7/705 (2013.01); G03F 7/70633 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for dividing a plurality of substrates into groups associated with group specific corrections for a lithographic apparatus, the method comprising:
obtaining pre-exposure data and post-exposure data associated with the plurality of substrates; and
clustering, by a hardware computer system, the substrates using separately the pre-exposure data and post-exposure data to obtain a first set of groups within the plurality of substrates associated with the pre-exposure data and a second set of groups within the plurality of substrates associated with the post-exposure data, wherein the clustering provides:
i) an optimized number of groups within the first set of groups and the second set of groups; and/or
ii) matching of the first set of groups with the second set of groups based on optimization of a matching metric.