US 12,439,836 B2
Semiconductor memory devices with electrically isolated stacked bit lines and methods of manufacture
Tung Ying Lee, Hsinchu (TW); Shao-Ming Yu, Zhubei (TW); and Kai-Tai Chang, Kaohsiung (TW)
Assigned to Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed on Aug. 1, 2023, as Appl. No. 18/363,500.
Application 18/363,500 is a division of application No. 17/383,726, filed on Jul. 23, 2021, granted, now 11,849,655.
Claims priority of provisional application 63/174,627, filed on Apr. 14, 2021.
Prior Publication US 2023/0380310 A1, Nov. 23, 2023
Int. Cl. H10N 70/00 (2023.01); H10B 63/00 (2023.01)
CPC H10N 70/8418 (2023.02) [H10B 63/24 (2023.02); H10N 70/011 (2023.02)] 20 Claims
OG exemplary drawing
 
1. A device comprising:
a dielectric layer over a substrate;
a first bit line over the dielectric layer;
an insulating layer over the first bit line;
a second bit line over the insulating layer;
a hard mask layer over the second bit line;
a memory material extending over a sidewall of the first bit line, a sidewall of the insulating layer, a sidewall of the second bit line, and a sidewall of the hard mask layer;
a selector layer extending over the memory material;
a control word line extending over the selector layer and over the dielectric layer; and
a first via extending through the dielectric layer and contacting a bottom surface of the control word line.