US 12,439,783 B2
Display substrate and preparation method therefor, and display apparatus
Luke Ding, Beijing (CN); and Yongqian Li, Beijing (CN)
Assigned to Hefei BOE Joint Technology Co., Ltd., Anhui (CN); and BOE Technology Group Co., Ltd., Beijing (CN)
Appl. No. 17/799,918
Filed by Hefei BOE Joint Technology Co., Ltd., Anhui (CN); and BOE Technology Group Co., Ltd., Beijing (CN)
PCT Filed Nov. 12, 2021, PCT No. PCT/CN2021/130250
§ 371(c)(1), (2) Date Aug. 15, 2022,
PCT Pub. No. WO2022/179189, PCT Pub. Date Sep. 1, 2022.
Claims priority of application No. 202110221026.9 (CN), filed on Feb. 26, 2021.
Prior Publication US 2024/0032355 A1, Jan. 25, 2024
Int. Cl. H10K 59/131 (2023.01); G09G 3/3233 (2016.01); H10K 59/12 (2023.01); H10K 59/124 (2023.01)
CPC H10K 59/131 (2023.02) [G09G 3/3233 (2013.01); H10K 59/1201 (2023.02); H10K 59/124 (2023.02); G09G 2300/0819 (2013.01); G09G 2300/0842 (2013.01); G09G 2310/08 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A display substrate, wherein on a plane perpendicular to the display substrate, the display substrate comprises a base substrate, a buffer layer disposed on the base substrate, a semiconductor layer disposed on the buffer layer, a first insulating layer overlying the semiconductor layer, a first gate metal layer disposed on the first insulating layer, a second insulating layer overlying the first gate metal layer, a second gate metal layer disposed on the second insulating layer, a third insulating layer overlying the second gate metal layer, a first source-drain metal layer disposed on the third insulating layer, and a planarization layer overlying the first source-drain metal layer;
at least one of the first gate metal layer and the second gate metal layer comprises a first power supply line extending in a first direction, and the first source-drain metal layer comprises a data line extending in a second direction, wherein the first direction intersects the second direction.