US 12,439,698 B2
Display device
Dong-Hwi Kim, Osan-si (KR); and Jin Jeon, Seoul (KR)
Assigned to SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do (KR)
Filed by Samsung Display Co., LTD., Yongin-si (KR)
Filed on Oct. 14, 2024, as Appl. No. 18/914,506.
Application 18/914,506 is a continuation of application No. 18/136,756, filed on Apr. 19, 2023, granted, now 12,148,763.
Application 18/136,756 is a continuation of application No. 17/555,370, filed on Dec. 17, 2021, granted, now 11,670,644, issued on Jun. 6, 2023.
Application 17/555,370 is a continuation of application No. 16/996,504, filed on Aug. 18, 2020, granted, now 11,244,967, issued on Feb. 8, 2022.
Claims priority of application No. 10-2020-0024388 (KR), filed on Feb. 27, 2020.
Prior Publication US 2025/0040252 A1, Jan. 30, 2025
Int. Cl. G09G 3/32 (2016.01); H10D 86/40 (2025.01); H10D 86/60 (2025.01); H10H 29/14 (2025.01); H10K 59/121 (2023.01); H10K 59/131 (2023.01); H10K 59/35 (2023.01)
CPC H10D 86/60 (2025.01) [G09G 3/32 (2013.01); H10D 86/441 (2025.01); G09G 2300/0426 (2013.01); G09G 2300/0809 (2013.01); G09G 2310/0243 (2013.01); G09G 2310/0267 (2013.01); H10H 29/142 (2025.01); H10K 59/1213 (2023.02); H10K 59/1216 (2023.02); H10K 59/131 (2023.02); H10K 59/35 (2023.02)] 13 Claims
OG exemplary drawing
 
1. A display device, comprising:
a substrate;
a polycrystalline semiconductor layer on the substrate, the polycrystalline semiconductor layer including a channel, a first electrode, and a second electrode of a first transistor and a channel, a first electrode, and a second electrode of a second transistor;
a first gate conductor layer including a gate electrode of the first transistor overlapping the channel of the first transistor, and a gate electrode of the second transistor overlapping the channel of the second transistor;
an oxide semiconductor layer on the substrate, the oxide semiconductor layer including a channel, a first electrode, and a second electrode of a third transistor;
a second gate conductor layer including a lower gate electrode of the third transistor overlapping the channel of the third transistor;
a third gate conductor layer including an upper gate electrode of the third transistor overlapping the channel of the third transistor;
a first data conductor layer including a first initialization voltage supply line electrically connected to the second transistor, a second initialization voltage supply line, and a first connection electrode electrically connected to the second electrode of the third transistor and the gate electrode of the first transistor; and
a fourth transistor connected to the second initialization voltage supply line,
wherein the second initialization voltage supply line is disposed on the same layer as the first initialization voltage supply line.