US 12,437,993 B2
Adhesion layers for EUV lithography
Andrea M. Chacko, Rolla, MO (US); Vandana Krishnamurthy, Rolla, MO (US); Yichen Liang, Round Rock, TX (US); Hao Lee, Camas, WA (US); Stephen Grannemann, Rolla, MO (US); and Douglas J. Guerrero, Tombeek (BE)
Assigned to Brewer Science, Inc., Rolla, MO (US)
Filed by Brewer Science, Inc., Rolla, MO (US)
Filed on Mar. 18, 2024, as Appl. No. 18/607,956.
Application 18/607,956 is a continuation of application No. 16/439,377, filed on Jun. 12, 2019, granted, now 11,972,948.
Claims priority of provisional application 62/684,359, filed on Jun. 13, 2018.
Prior Publication US 2024/0222122 A1, Jul. 4, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/00 (2006.01); G03F 1/24 (2012.01); H01L 21/02 (2006.01); H01L 21/027 (2006.01)
CPC H01L 21/0274 (2013.01) [G03F 1/24 (2013.01); G03F 7/70033 (2013.01); H01L 21/02115 (2013.01); H01L 21/02282 (2013.01); H01L 21/02304 (2013.01); H01L 21/02422 (2013.01)] 20 Claims
 
1. A method of forming a structure, said method comprising:
providing a substrate, said substrate including one or more intermediate layers thereon, said one or more intermediate layers comprising:
a spin-on carbon layer;
a hard mask layer;
both said spin-on carbon layer and said hardmask layer, said hardmask layer being on said spin-on carbon layer; or
both said hardmask layer and said spin-on carbon layer, said spin-on carbon layer being on said hardmask layer;
forming an adhesion layer on said spin-on carbon layer or on said hardmask layer, said adhesion layer:
having an average thickness that is greater than a monolayer but less than 9 nm;
a metal content of less than about 0.001% by weight, based upon the total weight of the adhesion layer taken as 100% by weight; and
being formed from a composition comprising a component dissolved or dispersed in a solvent system, said component being chosen from:
polymers comprising monomers chosen from glycidyl acrylate, glycidyl methacrylate, 2-hydroxy-3-phenoxypropyl acrylate, hydroxy propyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxyethyl acrylate, tert-butyl methacrylate, or mixtures thereof;
styrenes;
epoxies;
novolacs;
silanes;
cyanurates;
tris(2,3-epoxypropyl)isocyanurate;
vinyl compounds grafted with a functionalized carboxylic acid moiety, a chromophore, or both;
polymers comprising a vinyl monomer grafted with a functionalized carboxylic acid moiety, a chromophore, or both; or
mixtures thereof;
forming a photoresist layer on said adhesion layer; and
subjecting at least a portion of said photoresist layer to EUV radiation.