US 12,437,971 B2
Large area microwave plasma CVD apparatus
Justas Zalieckas, Bergen (NO)
Assigned to VESTLANDETS INNOVASJONSSELSKAP AS, Bergen (NO)
Appl. No. 17/052,346
Filed by Vestlandets Innovasjonsselskap AS, Bergen (NO)
PCT Filed May 8, 2019, PCT No. PCT/NO2019/050103
§ 371(c)(1), (2) Date Nov. 2, 2020,
PCT Pub. No. WO2019/216772, PCT Pub. Date Nov. 14, 2019.
Claims priority of application No. 20180654 (NO), filed on May 8, 2018.
Prior Publication US 2021/0057190 A1, Feb. 25, 2021
Int. Cl. H01J 37/32 (2006.01); C23C 16/511 (2006.01)
CPC H01J 37/32229 (2013.01) [H01J 37/32192 (2013.01); H01J 37/32266 (2013.01); C23C 16/511 (2013.01); H01J 37/32238 (2013.01); H01J 37/32256 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A large area microwave plasma chemical vapour deposition (LA MPCVD) reactor apparatus, comprising:
a reactor chamber adapted to provide a plasma region in an interior of the reactor chamber by electromagnetic energy at a first frequency;
a Composite Right/Left-Handed (CRLH) waveguide section comprising a plurality of periodically cascaded unit cells, each unit cell being balanced, wherein the CRLH waveguide section is adapted to operate with an infinite wavelength at the first frequency and having in a wall of the CRLH waveguide section a coupler arranged to couple electromagnetic energy from an interior of the CRLH waveguide section to the interior of the reactor chamber; and
a first sub-chamber and a second sub-chamber,
wherein the first sub-chamber comprises the coupler,
wherein the second sub-chamber is adapted to comprise the plasma region, and
wherein the electromagnetic energy is provided from the CRLH waveguide section to the second sub-chamber via the first sub-chamber.