US 12,437,966 B2
Systems and methods for reverse pulsing
Maolin Long, Santa Clara, CA (US); Zhongkui Tan, Fremont, CA (US); Ying Wu, Livermore, CA (US); Qian Fu, Pleasanton, CA (US); Alex Paterson, San Jose, CA (US); and John Drewery, San Jose, CA (US)
Assigned to Lam Research Corporation, Fremont, CA (US)
Filed by Lam Research Corporation, Fremont, CA (US)
Filed on Oct. 3, 2023, as Appl. No. 18/480,495.
Application 18/480,495 is a continuation of application No. 15/701,176, filed on Sep. 11, 2017, granted, now 11,798,785.
Application 15/701,176 is a continuation of application No. 14/863,331, filed on Sep. 23, 2015, granted, now 9,761,459, issued on Sep. 12, 2017.
Claims priority of provisional application 62/201,541, filed on Aug. 5, 2015.
Prior Publication US 2024/0030000 A1, Jan. 25, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/32 (2006.01); H01L 21/3065 (2006.01); H01L 21/67 (2006.01)
CPC H01J 37/321 (2013.01) [H01J 37/32128 (2013.01); H01J 37/32146 (2013.01); H01J 37/32183 (2013.01); H01J 37/32577 (2013.01); H01L 21/3065 (2013.01); H01L 21/67069 (2013.01)] 7 Claims
OG exemplary drawing
 
1. A method comprising:
generating a plurality of source radio frequency (RF) signals;
generating a plurality of bias RF signals;
supplying the plurality of source RF signals to a first match that is coupled to a top coil of a plasma chamber, wherein the plurality of source RF signals are supplied to the first match to facilitate outputting a modified source signal; and
supplying the plurality of bias RF signals to a second match that is coupled to an electrode of the plasma chamber, wherein the plurality of bias RF signals are supplied to the second match to facilitate outputting a modified bias signal that is reversely synchronized compared to the modified source signal.