US 12,437,963 B2
Deep structure signal detection and enhancement by separation to upper (topography) and lower (bottom) areas for robust blind denoising self supervision (BDSS)
Vladislav Kaplan, Baanana (IL)
Assigned to ETROLOGY, LLC, Sandy, OR (US)
Filed by ETROLOGY, LLC, Sandy, OR (US)
Filed on Jul. 24, 2023, as Appl. No. 18/357,686.
Prior Publication US 2025/0035438 A1, Jan. 30, 2025
Int. Cl. H01J 37/22 (2006.01)
CPC H01J 37/222 (2013.01) 6 Claims
OG exemplary drawing
 
1. A method of deep structure detection for a critical dimension scanning electron microscope (CDSEM) image, the method comprising:
obtaining an image of an area of a semiconductor structure having at least two layers using a charged particle imager;
obtaining an upper topography region and a bottom deep structure region by applying a self-tunable mask to the obtained image of the area of the semiconductor structure;
denoising and enhancing the upper region topography;
applying blind denoising by self-supervision (BDSS) to the bottom deep structure region and locally enhancing the denoised bottom deep structure region; and
combining the denoised and enhanced upper region topography and the denoised and enhanced bottom deep structure region to obtain a single denoised enhanced image.