US 12,437,913 B2
Coil inductor and method for forming the same
Mingliang Wang, Fujian (CN); and Xuesong Liu, Fujian (CN)
Assigned to INMICRO MAGNETIC INTEGRITY TECHNOLOGY CO., LTD., Xiamen (CN)
Filed by INMICRO MAGNETIC INTEGRITY TECHNOLOGY CO., LTD., Xiamen (CN)
Filed on Apr. 14, 2022, as Appl. No. 17/720,585.
Application 17/720,585 is a continuation of application No. PCT/CN2022/083312, filed on Mar. 28, 2022.
Prior Publication US 2023/0307174 A1, Sep. 28, 2023
Int. Cl. H01F 27/32 (2006.01); H01F 27/28 (2006.01)
CPC H01F 27/32 (2013.01) [H01F 27/2828 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A coil inductor, comprising:
a first conductive coil;
a first insulation film disposed on the first conductive coil, the first insulation film comprising at least one first through hole;
a second conductive coil disposed on the first insulation film;
a second insulation film disposed on the second conductive coil, the second insulation film comprising at least one second through hole unaligned with the first through hole;
a third conductive coil disposed on the second insulation film,
wherein the first conductive coil is in electric contact with the second conductive coil through a first contact disposed in the first through hole, and the second conductive coil is in electric contact with the third conductive coil through a second contact disposed in the second through hole;
a first thickness of the first conductive coil, the second conductive coil, and the third conductive coil is between 20 micrometers and 100 micrometers;
a second thickness of the first insulation film and the second insulation film is between 5 micrometers and 50 micrometers; and
the first contact comprises a hollow structure.