US 12,437,904 B2
Resistance alloy for use in shunt resistor, use of resistance alloy in shunt resistor, and shunt resistor using resistance alloy
Yoshitaka Kumeda, Nagano (JP); and Tadahiko Yoshioka, Nagano (JP)
Assigned to KOA Corporation, Nagano (JP)
Appl. No. 18/022,926
Filed by KOA CORPORATION, Nagano (JP)
PCT Filed Jul. 16, 2021, PCT No. PCT/JP2021/026813
§ 371(c)(1), (2) Date Feb. 23, 2023,
PCT Pub. No. WO2022/044611, PCT Pub. Date Mar. 3, 2022.
Claims priority of application No. 2020-145278 (JP), filed on Aug. 31, 2020.
Prior Publication US 2023/0326631 A1, Oct. 12, 2023
Int. Cl. H01C 1/00 (2006.01); C22C 9/05 (2006.01); C22F 1/02 (2006.01); C22F 1/08 (2006.01); H01C 7/13 (2006.01)
CPC H01C 1/00 (2013.01) [C22C 9/05 (2013.01); C22F 1/02 (2013.01); C22F 1/08 (2013.01); H01C 7/13 (2013.01)] 5 Claims
OG exemplary drawing
 
1. A resistance alloy for use in a current detection shunt resistor, the resistance alloy being a quaternary alloy consisting of copper, manganese, silicon, and iron, and comprising 4.5 to 5.5 mass % of manganese, 0.05 to 0.30 mass % of silicon, 0.10 to 0.30 mass % of iron, and a balance being copper, and having a specific resistance of 15 to 25 μΩ·cm,
wherein a silicon oxide is formed on a surface of the resistance alloy.