US 12,437,900 B2
Extremely low resistance films and methods for modifying or creating same
Douglas J. Gilbert, Flagstaff, AZ (US); and Timothy S. Cale, Phoenix, AZ (US)
Assigned to Ambature, Inc., Scottsdale, AZ (US)
Filed by Ambature, Inc., Scottsdale, AZ (US)
Filed on Sep. 15, 2022, as Appl. No. 17/945,351.
Application 17/945,351 is a continuation of application No. 16/822,387, filed on Mar. 18, 2020, abandoned.
Application 16/822,387 is a continuation of application No. 15/167,535, filed on May 27, 2016, abandoned.
Application 16/822,387 is a continuation of application No. 15/167,556, filed on May 27, 2016, granted, now 11,316,092.
Application 15/167,535 is a continuation of application No. 14/105,212, filed on Dec. 13, 2013, granted, now 9,472,324.
Application 15/167,535 is a continuation of application No. 14/194,226, filed on Feb. 28, 2014, granted, now 9,431,156.
Application 15/167,535 is a continuation of application No. 14/450,308, filed on Aug. 4, 2014, granted, now 9,356,220.
Application 14/105,212 is a continuation of application No. 12/896,873, filed on Oct. 2, 2010, granted, now 8,609,593.
Application 14/194,226 is a continuation of application No. 12/896,870, filed on Oct. 2, 2010, abandoned.
Application 14/450,308 is a continuation of application No. 13/495,523, filed on Jun. 13, 2012, granted, now 8,796,181.
Application 13/495,523 is a continuation of application No. 12/794,688, filed on Jun. 4, 2010, granted, now 8,211,833.
Application 15/167,556 is a continuation of application No. 14/169,351, filed on Jan. 31, 2014, granted, now 9,601,681.
Application 15/167,556 is a continuation of application No. 12/896,874, filed on Oct. 2, 2010, granted, now 9,356,219.
Application 14/169,351 is a continuation of application No. 12/896,876, filed on Oct. 2, 2010, granted, now 8,759,257.
Claims priority of provisional application 61/248,130, filed on Oct. 2, 2009.
Claims priority of provisional application 61/248,134, filed on Oct. 2, 2009.
Prior Publication US 2024/0062933 A1, Feb. 22, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. H01B 12/06 (2006.01); B05D 1/36 (2006.01); H01B 1/08 (2006.01); H01B 12/14 (2006.01); H01C 7/00 (2006.01); H10N 60/01 (2023.01); H10N 60/85 (2023.01)
CPC H01B 12/06 (2013.01) [B05D 1/36 (2013.01); H01B 1/08 (2013.01); H01B 12/14 (2013.01); H01C 7/00 (2013.01); H10N 60/01 (2023.02); H10N 60/0268 (2023.02); H10N 60/0856 (2023.02); H10N 60/85 (2023.02); H10N 60/855 (2023.02); H10N 60/857 (2023.02); H10N 60/0661 (2023.02); Y10T 428/31678 (2015.04)] 19 Claims
OG exemplary drawing
 
1. A method for improving operational characteristics of an ELR film, the ELR film comprising an ELR material having a crystalline structure, the method comprising:
layering a modifying material onto an appropriate surface of the ELR film to create a modified ELR film, wherein the modified ELR film has improved operational characteristics over those of the ELR film without the modifying material.