| CPC G05D 7/0617 (2013.01) | 11 Claims |
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1. A gas supply apparatus for substrate processing apparatus, the gas supply apparatus comprising:
a first gas supply unit for supplying a gas to a first gas injection unit; and
a second gas supply unit for supplying a gas to a second gas injection unit,
wherein:
the first gas supply unit comprises a first supply line connected to the first gas injection unit, a plurality of first gas supply modules connected to the first supply line, and a first measurement module measuring a first pressure of the first supply line,
the second gas supply unit comprises a second supply line connected to the second gas injection unit, a plurality of second gas supply modules connected to the second supply line, and a second measurement module measuring a second pressure of the second supply line,
the first measurement module checks whether the first pressure is outside a first reference value,
the second measurement module checks whether the second pressure is outside a second reference value
wherein the gas supply apparatus further comprises:
a control unit setting the first reference value and the second reference value; and
a storage unit accumulating pressure data measured by each of the first measurement module and the second measurement module,
wherein the control unit changes the first reference value and the second reference value by using the pressure data accumulated in the storage unit.
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