| CPC G03F 9/7088 (2013.01) [G03F 7/70175 (2013.01); G03F 7/70191 (2013.01)] | 17 Claims |
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1. A detection apparatus, comprising:
an alignment microscope that is disposed in an optical path of first light with which a mask mark as an alignment mark of an exposure mask is irradiated, and in an optical path of second light with which a workpiece mark as an alignment mark of a workpiece is irradiated, and captures an image of the mask mark and an image of the workpiece mark; and
a position detector that detects a position of the mask mark and a position of the workpiece mark on a basis of the image of the mask mark and the image of the workpiece mark, the images being captured by the alignment microscope, wherein
the alignment microscope includes
an imaging unit,
a beam splitter that splits each of the first light and the second light and emits the split first light and the split second light to the imaging unit, and one or more aberration correction lenses,
the beam splitter includes
a light-splitting surface that splits each of the first light and the second light, and
a first member and a second member that are connected to each other with the light-splitting surface being sandwiched therebetween,
all of a first incident surface on which the first light is incident, a first emission surface from which the first light is emitted, a second incident surface on which the second light is incident, and a second emission surface from which the second light is emitted are configured to have different surface directions with respect to the light-splitting surface, and
the one or more aberration correction lenses include
one or more first aberration correction lenses that are disposed in a first optical path, the first optical path being the optical path of the first light to the imaging unit, and
one or more second aberration correction lenses that are disposed in a second optical path, the second optical path being the optical path of the second light to the imaging unit.
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